Department of Materials Engineering, The University of Tokyo  KITA RESEARCH GROUP 杮暥傊僕儍儞僾
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KITA RESEARCH GROUP - Functional Ultrathin Film Engineering -

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Welcome!

Material engineering for functionality design of the nano-scaled ultrathin films and their hetero-interfaces is now having a crucial role in the development of advanced electron devices. Our researches are focusing on designing the electric / magnetic / optical functions of device materials and their stacks, especially for development of highly-efficient energy conversion power devices and ultralow-power consuming nano-electron devices, toward the future energy-saving society.

Koji KITA
Associate Professor

7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 Japan, The University of Tokyo, Engineering Building #4-441
TEL/FAX +81-3-5841-7164
kita(at)scio.t.u-tokyo.ac.jp

WHY DON'T YOU JOIN US?
Your visit is anytime welcomed at
Room #441 in engineering bld.#4. Please contact Prof. Kita before your visit.

NEWS
Tamura-kun & Prof. Kita joined the Tsinghua University-Univ. of Tokyo Joint Multidisciplinary Symposium@Beijing (May 2019) See our gallery
Our new publication丗 our recent results on the 4H-SiC surface lattice strain introduction and recovery mechanism was published in Appl. Phys. Express: "Kinetics of lattice distortion introduction and lattice relaxation at the surface of thermally-oxidized 4H-SiC (0001)". See our publications
We newly welcomed three undergraduate members ! Hasegawa-kun, Kaneda-kun, and Liu-kun. (Apr 2019) See our member list

Coming Conferences Information
International Conference on Insulating Films on Semiconductors (INFOS) 2019 @Cambridge, UK (June 30-July 3, 2019)
236th ECS Meeting, Symposium D01 - "Semiconductors, Dielectrics, and Metals for Nanoelectronics 17"@Atlanta, USA (Oct13-17, 2019)
International Workshop on Dielectric Thin Films for Future Electron Devices ?Science and Technology ?(2019IWDTF)@Tokyo (Nov. 18-20, 2019)
8th International Symposium on Control of Semiconductor Interfaces (ISCSI-VIII) @Sendai, Japan (Nov 27-30)


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 KITA RESEARCH GROUP The University of Tokyo