Department of Materials Engineering, The University of Tokyo  KITA RESEARCH GROUP 杮暥傊僕儍儞僾
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KITA RESEARCH GROUP - Functional Ultrathin Film Engineering -

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Welcome!

Material engineering for functionality design of the nano-scaled ultrathin films and their hetero-interfaces is now having a crucial role in the development of advanced electron devices. Our researches are focusing on designing the electric / magnetic / optical functions of device materials and their stacks, especially for development of highly-efficient energy conversion power devices and ultralow-power consuming nano-electron devices, toward the future energy-saving society.

Koji KITA
Associate Professor

7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 Japan, The University of Tokyo, Engineering Building #4-441
TEL/FAX +81-3-5841-7164
kita(at)scio.t.u-tokyo.ac.jp
WHY DON'T YOU JOIN US?
Your visit is anytime welcomed at
Room #441 in engineering bld.#4. Please contact Prof. Kita before your visit.
NEWS
At International Workshop on Dielectric Thin Films for Future Electron Devices: Science and Technology (IWDTF2019), our paper "Investigation of Thermal Oxidation-induced Lattice Distortion at the Surface of 4H-SiC and Its Origins" by Adhi Dwi Hatmanto and Koji Kita, was awarded for Best Paper Award !, and M2 Hamaguchi-kun recieved Young Award. See our galler
The second series of fall conferences : M2 Hamaguchi-kun, M2 Koyanagi-kun, and Prof. Kita had oral presentations at IWDTF@Tokyo Institute of Technology (Nov. 18-20) and D1 Chu-san made oral presentation and Prof. Kita had an invited talk at ISCSI-VIII@Tohoku Univ in Sendai. See our publications See also our galler
"SiC MOS Interface mini workshop at University of Tokyo" was held on Nov. 15, with a special lecture by Prof. Leonard Feldman from Rutgers University (at Seminar room 205)! See our gallery

Coming Conferences Information
To be updated soon.


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 KITA RESEARCH GROUP The University of Tokyo