KITA RESEARCH GROUP - Functional Ultrathin Film Engineering -
Material engineering for functionality design of the nano-scaled ultrathin
films and their hetero-interfaces is now having a crucial role in the development
of advanced electron devices. Our researches are focusing on designing
the electric / magnetic / optical functions of device materials and their
stacks, especially for development of highly-efficient energy conversion
power devices and ultralow-power consuming nano-electron devices, toward
the future energy-saving society.
7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 Japan, The University of Tokyo,
Engineering Building #4-441
WHY DON'T YOU JOIN US? 仛 Your visit is anytime welcomed at Room #441 in engineering bld.#4. Please contact Prof. Kita before your visit.
Prof. Kita made an oral presentation at IWGO-3 (The 3rd International
Workshop on Gallium Oxide and Other Related Materials)@Columbus, OH, USA.
(Aug 2019) See our publications
Our new publication丗 our recent results on the 4H-SiC surface lattice
strain introduction mechanism was published in Appl. Phys. Express: "Similarity
and difference of the impact of ion implantation and thermal oxidation
on the lattice structure of 4H-SiC (0001) surface". (July 2019) See our publications
D1 Tae-Hyeon Kil and D1 Siri Nittakayasetwat made oral presentations at INFOS2019@Cambridge, UK. (July 2019)