Department of Materials Engineering, The University of Tokyo KITA RESEARCH GROUP 杮暥傊僕儍儞僾
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KITA RESEARCH GROUP - Functional Ultrathin Film Engineering -

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Welcome!

Material engineering for functionality design of the nano-scaled ultrathin films and their hetero-interfaces is now having a crucial role in the development of advanced electron devices. Our researches are focusing on designing the electric / magnetic / optical functions of device materials and their stacks, especially for development of highly-efficient energy conversion power devices and ultralow-power consuming nano-electron devices, toward the future energy-saving society.

Koji KITA
Associate Professor

7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 Japan, The University of Tokyo, Engineering Building #4-441
TEL/FAX +81-3-5841-7164
kita(at)scio.t.u-tokyo.ac.jp

WHY DON'T YOU JOIN US?
仛 Your visit is anytime welcomed at
Room #441 in engineering bld.#4. Please contact Prof. Kita before your visit.

NEWS
Our collaborated work with Mitsubishi Electric: "Channel engineering of 4H-SiC MOSFETs using sulphur as a deep level donor" was presented at IEDM2019 (Dec 1-5 @San Francisco, CA, USA).
We presented two papers at AiMES(ECS&SMEQ Joint International Meeting)@Cancun, Mexico (Sep 30-Oct 4). We also made presentations at ACSIN-14/ICSPM26 at Sendai (2 papers) See our publications Resent photos
 Our new publication丗 our results on 4H-SiC MOSFET channel mobility enhancement by H2O-annealing was published in Appl. Phys. Lett. See our publications
New foreign members joined our group ! (Oct. 2018) See our group members See our gallery

Coming Conferences Information
 International Conference on Insulating Films on Semiconductors (INFOS) 2019 @Cambridge, UK (June 30-July 3, 2019), Abstract submission deadline: Jan 10.

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 KITA RESEARCH GROUP The University of Tokyo