KITA RESEARCH GROUP - Functional Ultrathin Film Engineering -
Material engineering for functionality design of the nano-scaled ultrathin
films and their hetero-interfaces is now having a crucial role in the development
of advanced electron devices. Our researches are focusing on designing
the electric / magnetic / optical functions of device materials and their
stacks, especially for development of highly-efficient energy conversion
power devices and ultralow-power consuming nano-electron devices, toward
the future energy-saving society.
7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 Japan, The University of Tokyo,
Engineering Building #4-441
WHY DON'T YOU JOIN US? 仛 Your visit is anytime welcomed at Room #441 in engineering bld.#4. Please contact Prof. Kita before your visit.
Tamura-kun & Prof. Kita joined the Tsinghua University-Univ. of Tokyo
Joint Multidisciplinary Symposium@Beijing (May 2019) See our gallery
Our new publication丗 our recent results on the 4H-SiC surface lattice
strain introduction and recovery mechanism was published in Appl. Phys.
Express: "Kinetics of lattice distortion introduction and lattice
relaxation at the surface of thermally-oxidized 4H-SiC (0001)". See our publications
We newly welcomed three undergraduate members ! Hasegawa-kun, Kaneda-kun,
and Liu-kun. (Apr 2019) See our member list