KITA RESEARCH GROUP - Functional Ultrathin Film Engineering -
Material engineering for functionality design of the nano-scaled ultrathin
films and their hetero-interfaces is now having a crucial role in the development
of advanced electron devices. Our researches are focusing on designing
the electric / magnetic / optical functions of device materials and their
stacks, especially for development of highly-efficient energy conversion
power devices and ultralow-power consuming nano-electron devices, toward
the future energy-saving society.
7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 Japan, The University of Tokyo,
Engineering Building #4-441
WHY DON'T YOU JOIN US? 仛 Your visit is anytime welcomed at Room #441 in engineering bld.#4. Please contact Prof. Kita before your visit.
At International Workshop on Dielectric Thin Films for Future Electron
Devices: Science and Technology (IWDTF2019), our paper "Investigation of Thermal Oxidation-induced Lattice Distortion at the Surface
of 4H-SiC and Its Origins" by Adhi Dwi Hatmanto and Koji Kita, was awarded for Best Paper Award !, and M2 Hamaguchi-kun recieved Young Award. See our galler
The second series of fall conferences : M2 Hamaguchi-kun, M2 Koyanagi-kun,
and Prof. Kita had oral presentations at IWDTF@Tokyo Institute of Technology
(Nov. 18-20) and D1 Chu-san made oral presentation and Prof. Kita had an
invited talk at ISCSI-VIII@Tohoku Univ in Sendai.
See our publicationsSee also our galler "SiC MOS Interface mini workshop at University of Tokyo" was held on Nov. 15, with a special lecture by Prof. Leonard Feldman from
Rutgers University (at Seminar room 205)! See our gallery
Coming Conferences Information To be updated soon.