KITA RESEARCH GROUP - Functional Ultrathin Film Engineering -
MESSAGE
Welcome!
Material engineering for functionality design of the nano-scaled ultrathin
films and their hetero-interfaces is now having a crucial role in the development
of advanced electron devices. Our researches are focusing on designing
the electric / magnetic / optical functions of device materials and their
stacks, especially for development of highly-efficient energy conversion
power devices and ultralow-power consuming nano-electron devices, toward
the future energy-saving society.
Koji KITA
Associate Professor
7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 Japan, The University of Tokyo,
Engineering Building #4-441
TEL/FAX +81-3-5841-7164
kita(at)scio.t.u-tokyo.ac.jp
WHY DON'T YOU JOIN US? 仛 Your visit is anytime welcomed at Room #441 in engineering bld.#4. Please contact Prof. Kita before your visit.
NEWS
Congratulation for graduation! Nishida-kun, Suzuki-kun, Tamura-kun, and
Watanabe-kun. (Mar 2019) See our gallery Our new publication丗 our results on the temperature effects on oxide interface
dipole layer strength was published in J. Appl. Phys. : "Anomalous
temperature dependence of Al2O3/SiO2 and Y2O3/SiO2 interface dipole layer
strengths".See our publications Our collaborated work with Mitsubishi Electric: "Channel engineering
of 4H-SiC MOSFETs using sulphur as a deep level donor" was presented
at IEDM2019 (Dec 1-5 @San Francisco, CA, USA).See our publications
Congratulation for graduation! Nishida-kun, Suzuki-kun, Tamura-kun, and
Watanabe-kun. (Mar 2019) 
Coming Conferences Information